Photomasks

Topological information in CIF and GD2 format;

Types of masks:

• master mask
• submaster mask
• copies (operational masks)

Substrate-boron-silicon glass;

Substrate size - 102x102mm, 127x127mm;

Substrate thickness - 2,5mm;

Coating layer- chrome or iron oxide;

Defect density - 0,25 defects/cm² (>1µm);

Minimum feature - size 2 µm;

Critical dimension size - ±0,4µm.

Alignment tolerance - ±0,8µm.